欢迎访问硅基纳米生物技术课题组(Sense Group) 中文 S
 
 
当前位置:首页>新闻动态>课题组王思轶等同学在Appl. Phys. Lett.上发表论文
新闻动态

课题组王思轶等同学在Appl. Phys. Lett.上发表论文

发布日期:2014-06-19


题目: Reactive ion etching-assisted surface-enhanced Raman scattering measurements on the single nanoparticle level


作者:Siyi Wang1, Xiangxu Jiang1, Tingting Xu1,2,Xinpan Wei1, Shuit-tong, Lee1,a) and Yao He1,a)


单位:
1Institute of Functional Nano and Soft Materials (FUNSOM), Jiangsu Key Laboratory for Carbon-Based Functional Materials and Devices, and Devices Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou, Jiangsu 215123, China
2Center of Super-Diamond and Advanced Films (COSDAF), City University of Hong Kong, Hong Kong, China and Department of Physics and Materials Science, City University of Hong Kong, Hong Kong, China




摘要:Single-nanoparticle surface-enhanced Raman scattering (SERS) measurement is of essential importance for both fundamental research and practical applications. In this work, we develop a class of single-particle SERS approaches, i.e., reactive ion etching (RIE)-assisted SERS measurements correlated with scanning electron microscopy (SEM) strategy (RIE/SERS/SEM),  enabling precise and high-resolution identification of single gold nanoparticle (AuNP) in facile and reliable manners. By using AuNP-coated silicon wafer and quartz glass slide as models, we further employ the developed RIE/SERS/SEM method for interrogating the relationship between SERS substrates and enhancement factor (EF) on the single particle level. Together with theoretical calculation using an established finite-difference-time-domain (FDTD) method, we demonstrate silicon wafer as superior SERS substrates, facilitating improvement of EF values.



影响因子:3.794


分区情况: 2区

相关链接:
http://scitation.aip.org/content/aip/journal/apl/104/24/10.1063/1.4884060

 
首页
研究领域
研究成果
组内成员
新闻动态
组内事务
联系我们
 
友情链接

版权所有©2013 何耀教授课题组(Sense Group) 苏州大学功能纳米与软物质研究院(FUNSOM)

地址:江苏省苏州市工业园区仁爱路199号910楼 邮编:215123